TMI’s cleanroom is a 3,000 square feet facility, class 100 used primarily for lithography processes and class 1,000 for fabrication, etching and materials growth, and testing. A wide array of materials deposition tools are available including e-beam and sputtering systems, thermal evaporation systems in gloveboxes, and Langmuir-Blodgett trough. Located in the Faulkner Nanotechnology Building on the 4^th floor, the space provides ample room for materials research across a wide range of materials classes.