Equipment Type:

Cleanroom Instrumentation

Thin Film Fabrication

Instrument Capabilities

Provides thin-film deposition through electron-beam evaporation and magnetron sputtering, enabling controlled deposition of a wide range of metallic and other materials

System Characteristics:

• Four 15 cc -beam sources for metals and certain oxides
• One RF sputter head for oxides and metals
• One DC sputter head for metals
• Targets for sputtering should be 3″ diameter and 1/8″ to 1/4″ thickness
• Base pressure achieved by pumping overnight: 5 -07 Torr
• E-beam substrate available
• Film thickness monitored using a crystal sensor.
• Sample rotation available
• Deposition process is fully manual

E-beam materials provided by TMI: Ag, Al, Cu, Ti, SiO2, Cr and Au. Gold usage will be charged at a $70/gram rate. The gold crucible should be checked-out from TMI staff.

Sputtering targets provided by TMI: Al and Cr.

All other materials must be provided by the user.

Fees and Policies

Cleanroom Entry fee: (The cleanroom entry fee is charged in addition to the cleanroom facility usage fee)

• UT Users: $6
• Higher Education/State Agencies: $10
• Corporate/External Users: $10

Cleanroom Facility

• UT Users: $35/hour
• Higher Education/State Agencies (Assisted): $92/hour
• Corporate/External Users (Assisted): $94/hour
• Higher Education/State Agencies (Unassisted): $64/hour
• Corporate/External Users (Unassisted): $65/hour

Please contact Dr. Raluca Gearba and/or James Smitherman to schedule a training session.