ME 397 – High Throughput Nanopatterning

Course Details
Unique Number18420
Instructor S.V. Sreenivasan
Meeting Days / TimeLecture: TTH, 5:00pm-6:30pm
LocationETC 2.114
Course Description

Explore sub-50nm fabrication using mechanic patterning techniques.  Provide an overview of photolithography, mechanical nano-patterning processes, hot embossing, and UV imprint lithography.  Wafer scale and roll-to-roll nano patterning will be introduced with applications in electronics, photonics, and nano medicine.  Physics of nano replication, process limits, template (mold) fabrication, defect mechanisms, and factors affecting throughput will also be discussed.

Meets with ME 379M and EE 379K.